Atomic Layer Deposition

Interactive model, with minimal support

Overview and Learning Objectives

In this activity, students undertake a simulation of the Atomic Layer Deposition (ALD) technique, a CVD process in which two complementary precursors (e.g., Al(CH3)3 and H2O) are alternatively introduced into the reaction chamber, and build an atomic scale film.

In this activity, students undertake a simulation of the Atomic Layer Deposition (ALD) technique, a CVD process in which two complementary precursors (e.g., Al (CH3)3 and H2O) are alternatively introduced into the reaction chamber, and build an atomic scale film.

Students will be able to:

• manipulate the model in order to assemble an atomic-scale film;
• experiment with temperature and discover its effect on irregularities in this process.

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Classroom Practice

You might link the model to an animation of ALD as used in manufacturing: http://www.cambridgenanotech.com/animation/

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Central Concepts

Key Concept:

Molecules can be layered on top of precursors to build up the thickness of a film useful in atomic-scale manufacturing.

Additional Related Concepts

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Macro Micro Link

This nanoscale technique is useful in the printing of circuitry.

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